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- W2357708966 abstract "X ray reflectivity measurement using synchrotron radiation is a accurate and easy method to determine the structure of a thin film, compared with other experimental methods. X ray reflectivity investigation using synchrotron radiation were performed on Cr/SiO 2 thin film system. Reflectivity curves with good S/N ratio were collected. The thickness of Cr film and the roughness of the interface between Cr and SiO 2 substrate were obtained by Fourier analysis and least square fit of the experimental data. It is shown that the present method is effective for the determination of interfacial roughness." @default.
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- W2357708966 date "1998-01-01" @default.
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- W2357708966 title "STUDY ON THE STRUCTURE OF THIN FILM BY X RAY REFLECTIVITY WITH SYNCHROTRON RADIATION" @default.
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