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- W2358045146 abstract "Co_(90)Fe_(10) target was made by powder metallurgy method.The effect of annealing on the structure and magnetoresistance of CoFe flims was investigated.CoFe films were deposited by e-beam evaporation on thermally oxidized silicon wafers at room temperatrre.The base pressure was better than 5.5×10~(-4)Pa.The samples were annealed in the vacuum better than 3×10~(-5)Pa for 60 minutes at 150℃,280℃,330℃,450,respectively.The image of scan electron microscope of CoFe target shows that the target isn't very compact.The resistivity and magnetoresistance measurements show that the resisivity decreases and anisotropic magnetoresistance ratio increases obviously after 450℃ annealing.X-ray diffraction spectra show that the planar spaces of (111) plane of the CoFe films were smaller that that of the bulk and came close to the target's after annealing." @default.
- W2358045146 created "2016-06-24" @default.
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- W2358045146 date "2004-01-01" @default.
- W2358045146 modified "2023-09-25" @default.
- W2358045146 title "The effect of annealing on the structure and magnetoresistance of CoFe films" @default.
- W2358045146 hasPublicationYear "2004" @default.
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