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- W2358094516 abstract "Photoresist is one the most important material in wafer Fab.In this paper,OMR85 photoresist will be studied by studying its filmthickness.Sensitivity and linearity ect.It comes up a type of process which can be used in wass productin.A solution is submitted for the fact of attaching to mask when cointact exposure.And the throughput is improved." @default.
- W2358094516 created "2016-06-24" @default.
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- W2358094516 date "2002-01-01" @default.
- W2358094516 modified "2023-09-25" @default.
- W2358094516 title "Study and Application of OMR85 Phtot Resist" @default.
- W2358094516 hasPublicationYear "2002" @default.
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