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- W2358903159 abstract "ZnO: Al(ZAO) films were successfully prepared by dc magnetron reactive sputtering Al/Zn(2.0%) alloy target. The dependences of the spatial distribution of resistivity and the microstructure of ZAO films on temperature were reported. The chemical state and depth profile of Zn, Al and O in ZAO films also were studied by XPS and AES. At the same time, the electrical and optical properties of the films were measured." @default.
- W2358903159 created "2016-06-24" @default.
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- W2358903159 date "2000-01-01" @default.
- W2358903159 modified "2023-09-23" @default.
- W2358903159 title "STUDY OF TRANSPARENT CONDUCTIVE OXIDE ZnO:Al(ZAO) FILMS" @default.
- W2358903159 hasPublicationYear "2000" @default.
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