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- W2359097685 abstract "TiCx films,which ratio of C/Ti are different,were deposited with r.f.magnetron sputtering and ion beam mixing.X-ray photoelectron spectroscopy(XPS) method was used for characterization of the distribution and chemical bonding states of oxygen element in the TiCx films.Moreover,XPS was used for the analysis of the effect of C/Ti ratio and hydrogen irradiation.Through these results,an effective way to reduce oxygen content in TiCx films is intend to be found,which can improve the hydrogen-resistance characteristic and life of TiCx films." @default.
- W2359097685 created "2016-06-24" @default.
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- W2359097685 date "2010-01-01" @default.
- W2359097685 modified "2023-09-23" @default.
- W2359097685 title "Lnvestigations on Oxygen Behaviors in the Hydrogen-resistance TiC_x Films" @default.
- W2359097685 hasPublicationYear "2010" @default.
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