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- W2359125524 abstract "Reflective high energy electron diffraction(RHEED) has been used to characterize the Si and(SrTiO-3) single crystal substrates which are very popular substrates for thin film study and application in microelectronics and scientific research.The RHEED patterns of Si(100) substrates under various cleaning process are investigated,indicating that Hydrofluoric Acid cleaning for Si is very critical for epitaxial film preparation.The lattice parameter of SrTiO-3 obtained from its RHEED pattern and calculation is consistent with theoretical value,which paves a way to calculate the in-plane lattice parameters of epitaxial films." @default.
- W2359125524 created "2016-06-24" @default.
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- W2359125524 date "2006-01-01" @default.
- W2359125524 modified "2023-09-24" @default.
- W2359125524 title "RHEED Investigation of Single Crystal Substrate for Epitaxial Film Growth" @default.
- W2359125524 hasPublicationYear "2006" @default.
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