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- W2359620945 abstract "Ga-doped ZnO(ZGO) films are deposited by using DC magnetron sputtering with facing zinc oxide targets at room temperature in argon atmosphere.The crystal structure of the ZGO films is hexagonal wurtzite,and the orientation is along the c-axis perpendicular to the substrate.Textured ZGO films are prepared by etching the smooth films in 0.5% diluted HCl.The reflectivity of textured film in the visible range is decreased by 10% comparing with that of the smooth ZGO film,while the conductivity remains constant.The textured ZGO films are used as window layers in amorphous silicon based p-i-n thin film solar cells,leading to the effectively raise of the filed factors(FF) and efficiencies of the cells,which are 17.79 mA/cm2 and 7.23% respectively." @default.
- W2359620945 created "2016-06-24" @default.
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- W2359620945 date "2010-01-01" @default.
- W2359620945 modified "2023-09-26" @default.
- W2359620945 title "Application of textured ZGO films on amorphous silicon based solar cells" @default.
- W2359620945 hasPublicationYear "2010" @default.
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