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- W2360099574 abstract "The variation of the corrosion resistance(R) and capacitance(C) with the immersing time of the copper electrode in the 1 mM ODT solution was investigated, It was found that the formation of the high-order、compact and stable ODT-monolayer was completed within 30 min." @default.
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- W2360099574 date "2004-01-01" @default.
- W2360099574 modified "2023-09-23" @default.
- W2360099574 title "The Effect of the Immersing Time of the Copper Electrode in ODT Solution on a SAM of ODT Formed on a Copper Surface" @default.
- W2360099574 hasPublicationYear "2004" @default.
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