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- W2360146368 abstract "F-passivated ZnO nanocrystalline films were prepared from thermal oxidation of ZnF_2 films. The ZnF_2 films were deposited on a Si wafer by electron beam evaporation technique. X-ray diffraction and X-ray photoelectron spectroscopy were used to study the structural changes of ZnF_2 as a function of oxidation temperatures. When the ZnF_2 film was oxidized at 400 ℃ for 30 min, a polycrystalline hexagonal wurtzite structure of ZnO∶F was obtained. The room-temperature photoluminescence spectrum of the ZnO∶F film showed a strong near band edge ultraviolet emission located at 379 nm with a narrow linewidth of 73 meV and a very weak visible emission associated with deep level defects. The results indicated that the presence of residual F ions in ZnO film can dramatically decrease the visible emission and increase the ultraviolet emission of ZnO." @default.
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- W2360146368 date "2004-01-01" @default.
- W2360146368 modified "2023-09-23" @default.
- W2360146368 title "Photoluminescence of F-passivated ZnO Nanocrystalline Films from Thermally Oxidized ZnF_2 Films" @default.
- W2360146368 hasPublicationYear "2004" @default.
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