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- W2360157079 abstract "Nano-powder of CeO_2 and Al_2O_3 were prepared via homogenous precipitation, and the different polishing behavior of nano-CeO_2, nano-Al_2O_3 and nano-SiO_2 abrasives under the same polishing condition were studied by (atomic) force microscopy (AFM). The surface roughness of the wafer polished by nano-CeO_2 is lower than that polished by the nano-Al_2O_3 and nano-SiO_2, and its surface undulation is smaller. The influence of the deformation of the abrasive particle on polishing mechanism is considered for the first time. The deformation of the abrasive counteracts part of the cutting depth which determines the roughness of the polished surface. The deformation (amount) is in proportion to the hardness of the abrasives. The reason why the abrasives with different hardness has different polishing behavior is analyzed." @default.
- W2360157079 created "2016-06-24" @default.
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- W2360157079 date "2005-01-01" @default.
- W2360157079 modified "2023-09-24" @default.
- W2360157079 title "Effect of hardness of nano-sized abrasives on roughness of polished super-smooth surface" @default.
- W2360157079 hasPublicationYear "2005" @default.
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