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- W2361569089 abstract "The high-k dielectric HfOxNy films were prepared by rf reactive sputtering in oxygen and nitrogen surroundings.The effects of deposition temperatures on the chemical and interfacial properties of HfOxNy thin films were investigated.X-ray photoelectron spectroscopy results showed that the content of N in the films increased with deposition temperatures increasing.Fourier transform infrared spectroscopy results showed that an interfacial layer of SiO2 had been formed during deposition.The higher substrate temperature,the thicker interfacial layer." @default.
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- W2361569089 date "2009-01-01" @default.
- W2361569089 modified "2023-09-23" @default.
- W2361569089 title "Characteristics of HfO_xN_y thin films by rf reactive sputtering at different deposition temperatures" @default.
- W2361569089 hasPublicationYear "2009" @default.
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