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- W2361620181 abstract "The TiO2 films were prepared with different grain size on glass substrate by DC magnetron sputtering at the temperature of 250 ℃. The morphology and structure of the films were examined by Field Emission Scanning Electron Microscope (SEM) and X-ray diffraction (XRD). The results show that the grain size could be reduced effectively by the grid in sputtering process and the smaller the mesh is, the smaller the size of grains will be." @default.
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- W2361620181 date "2009-01-01" @default.
- W2361620181 modified "2023-09-28" @default.
- W2361620181 title "Study on Nano TiO_2 Films Deposited by DC Magnetron Sputtering" @default.
- W2361620181 hasPublicationYear "2009" @default.
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