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- W236254813 abstract "Abstract Single-layer Si–Zn–O (SZO) and multilayer SZO/Al films are deposited as water vapor barriers on polyimide (PI) substrates, using magnetron sputtering with SiO 2 –ZnO composite and Al targets. The effect of negative substrate bias voltage (V b ) on the microstructure and water vapor barrier properties of the single layer SZO and multilayer SZO/Al films is investigated. The as-deposited SZO film is found by X-ray diffraction analysis to be amorphous. For deposition at V b = 0 V, the SZO film has a columnar structure and rough surface morphology; the Al film exhibits pinholes on the surface. When moderate bias voltages (V b = − 50 V for SZO and − 70 V for Al films) are applied during deposition, a dense SZO film with smooth surface morphology and a pinhole-free Al film are obtained. An SZO/Al multilayer film shows better water vapor barrier performance than a single-layer SZO, which could be further enhanced by application of V b to the substrate during film growth." @default.
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- W236254813 date "2015-08-01" @default.
- W236254813 modified "2023-09-26" @default.
- W236254813 title "Water vapor barrier properties of Si–Zn–O/Al multilayer structures" @default.
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- W236254813 doi "https://doi.org/10.1016/j.surfcoat.2015.05.016" @default.
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