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- W2362623938 abstract "InGaN films of various compositions grown by MOCVD using PL, Hall and SEM techniques have been analysed. When the Ⅴ/Ⅲ ratio is equal to 5000, the temperature of 750℃ is suitable for the growth of InGaN samples. Under these specific conditions, the electron concentration is about 2.21×10 18 cm -3 and In content about 11.54%. The wavelength of the near band gap edge peak is 394nm at 295K and its full width of half maximum (FWHM) is about 116meV. According to the relations between the wavelength and the intensity of the near band gap edge peak,at the growth temperature of 750℃,it can be obtained the temperature coefficient α(d E /d T ) of the InGaN sample is 0.56×10 -3 eV/K and the binding energy of the near band gap edge peak is 32 4 meV.At higher growth temperatures (800℃ and 900℃) ,the In content and the PL intensity of InGaN sample will decrease. And the meatl particles of In can be observed on the surface of the sample." @default.
- W2362623938 created "2016-06-24" @default.
- W2362623938 creator A5043019475 @default.
- W2362623938 date "2001-01-01" @default.
- W2362623938 modified "2023-09-23" @default.
- W2362623938 title "Properties of InGaN Layers Grown on Sapphire Substrates by MOCVD" @default.
- W2362623938 hasPublicationYear "2001" @default.
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