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- W2364133324 abstract "A novel and environmental texture process based on a composition of sodium hydroxide(NaOH) and sodium hypochlorite(NaClO) solution for multicrystalline silicon was introduced.Results indicate that uniform and sulciform texture on the surface multicrystalline silicon can be obtained with the following etching conditions:VNaOH:VNaClO=1:3,17% NaOH,80 ℃ temperature,and the etching time of 20 min.The texture surface reflectance of as-grown wafers nearly reduces by 30%.And compared with wafers fabricated with the traditional industrial acid process,not only lower reflectance but also highly reactive chloride ion(Cl-) which can be used as gettering agent can be obtained.In addition,the procedure of HCl disposal can be omitted in the process of industrialization,and the operation environment can be improved greatly." @default.
- W2364133324 created "2016-06-24" @default.
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- W2364133324 date "2012-01-01" @default.
- W2364133324 modified "2023-09-23" @default.
- W2364133324 title "NaOH-NaOCl Textured Multicrystalline Silicon Surface for Solar Cell" @default.
- W2364133324 hasPublicationYear "2012" @default.
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