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- W2364139047 abstract "By pressing,nano-imprinting lithography technology to complete the pattern transfer of nano-structure is characterized by high resolution,high efficiency and low cost.By analyzing some factors influencing the pattern precision in nano-imprinting,corresponding measures have been proposed.Experiment has been carried out using self-made NIL01 nano-imprinting equipment.Experimental results show that,in considering a variety of factors influencing pattern precision,PMMA pattern with feature size of 100nm can be got in hot embossing through SiO_2 mask coated with Cr and NIL-01 nano-imprint equipment." @default.
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- W2364139047 date "2006-01-01" @default.
- W2364139047 modified "2023-09-23" @default.
- W2364139047 title "Process and Pattern Precision in Nano-imprinting Lithography" @default.
- W2364139047 hasPublicationYear "2006" @default.
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