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- W2364615089 abstract "In order to improve the properties of nikle films used as the sensitive materials of infrared detectors,nickel thermistor film was prepared on ordinary glass by DC magnetron sputtering applied as the core of the bolometer,used target was nickel bulk with high purity 99.99%.Sheet resistance of Ni thermal film was tested by the four-point probe meter under different temperature,and then the values of TCR was calculated according to the measured curves.The influence of the working pressure,argon gas flow rate and sputtering power on the temperature coefficient of resistance(TCR) was studied.After a lot of experimental study,the optimum process parameters,such as sputtering power of 225 W,working pressure of 1 Pa and argon gas flow of 120 sccm,were obtained.Under these conditions,the square resistance of film is 2.9 Ω/□,TCR is 2.3×10-3/K while sputtering time is 3min." @default.
- W2364615089 created "2016-06-24" @default.
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- W2364615089 date "2011-01-01" @default.
- W2364615089 modified "2023-09-23" @default.
- W2364615089 title "Study on Processing of Ni Thermo Sensitive Film by Magnetron Sputtering" @default.
- W2364615089 hasPublicationYear "2011" @default.
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