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- W2364987224 abstract "The hysteretic behaviour of aluminium oxide films in reactive sputtering was investigated by plasma optical emission spectroscopy technology.The evolutions of aluminium(396 nm) and aluminium oxide(484 nm) emission lines as functions of oxygen flow rates were measured.The crystal structure,atomic ratio and light transmission of aluminium oxide films were analyzed by X-ray diffraction(XRD),energy dispersive spectrometer(EDS) and ultraviolet-visible spectroscopy(UV-VIS).The results show that because the aluminium oxide deposited on the magnetron target impacts the alumina sputtering,the Al(396 nm) line intensity affects the crystal structure,atomic ratio and light transmission of aluminium oxide films.Meanwhile,the hysteresis curves show that an optimum deposition zone exists in the transition region where the oxygen flow rates is 1.5~2.0 mL/min.The sample obtains in this deposition zone' and its composition has the best chemical atomic weight ratio of 0.689.This indicates that the deposited aluminium oxide films have excellent qualities." @default.
- W2364987224 created "2016-06-24" @default.
- W2364987224 creator A5074798167 @default.
- W2364987224 date "2013-01-01" @default.
- W2364987224 modified "2023-09-23" @default.
- W2364987224 title "Hysteretic Process of Aluminium Oxide Films Deposited by Reactive Sputtering Method" @default.
- W2364987224 hasPublicationYear "2013" @default.
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