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- W2365314410 abstract "MgxZn1-xO∶Al UV-transparent conducting thin films were prepared on quartz glass by radio frequency magnetron.The effects of Mg doping content and annealing temperature on the microstructure and photoelectric properties of MgxZn1-xO∶Al films were investigated.The XRD results indicate that the MgxZn1-xO∶Al thin film retains the wurtzite structure of ZnO when the value of x≤0.4,changes to the cubic structure when the value of xis larger than 0.6.With value of Mg doping incresing,the resistivity of MgxZn1-xO∶Al rapid rises and the absorption band edge is blue shifted obviously,band gap and the transmittance in UV region enlarges when x≤4.The resistivity of MgxZn1-xO∶Al decreased rapidly with the annealing temperature increased from 400 ℃ to 600 ℃,then increase slowly when the annealing temperature is above 600 ℃,meanwhile the absorption edge has a blue shift." @default.
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- W2365314410 date "2010-01-01" @default.
- W2365314410 modified "2023-09-24" @default.
- W2365314410 title "Effects of Mg Doping Content and Annealing Temperature on Structure and Properties of MgxZn1-xO:Al UV-transparent Conducting Thin Films" @default.
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