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- W2365423204 abstract "In 65 nm chip design,the design for manufacturing(DFM),analysis methods and making concerted effort should be regaraed.The 193 nm immersion lithography technology,the equivalent ion injecting impurity technology,the atomic layer deposition(ALD)technology,the low stress CMP equipment and the damage-free cleaning technology are considered.The equipments should be all automation and the equipment layout should be miniaturization." @default.
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- W2365423204 date "2006-01-01" @default.
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- W2365423204 title "Problems in 65 nm Chip Design and Manufacture" @default.
- W2365423204 hasPublicationYear "2006" @default.
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