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- W2365796439 abstract "This paper describes an integrated methodology that combines short-flow test chips useful for exploring process-design systematic as well as random failure modes and an advanced inspection tool platform to characterize and monitor key Defects-of-Interest for accelerated defect-based yield learning at the 65nm technology node.Utilization of a unique fast electrical testing scheme,rapid analysis software along with optimized inspection facilitated shorter learning cycles for accelerated process development.Knowledge derived from the CV(R) based inspection setup in a leading 300mm fab was successfully transferred to manufacturing to facilitate inspection optimization for key Defects-of-Interest on product wafers." @default.
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- W2365796439 date "2008-01-01" @default.
- W2365796439 modified "2023-09-27" @default.
- W2365796439 title "Accelerated 65nm Yield Ramp through Optimization of Inspection on Process-Design Sensitive Test Chips" @default.
- W2365796439 hasPublicationYear "2008" @default.
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