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- W2365950861 abstract "Wide bandgap semiconductor zinc oxide thin films have been prepared by an electrochemical deposition performed in a chemical cell with three-electrodes, using an aqueous solution of Zn(NO_3)_2 as electrodeposition solution. The obtained ZnO thin films have optical bandgap of 3.35 eV and optical transmittance larger than 80% in the range of 400～2000 nm determined from their optical transmission spectra. XRD pattern indicates hexagonal wurtzite structure without c axis orientation for the ZnO thin films. AFM studies show a dense, irregular polycrystalline film structure with grain size below 250 nm. Stimulated emission occurs at a close ultraviolet wavelength of 403.9 nm under 355 nm optical pumping. When the excitation intensity exceeds a threshold (about 196.8 kW/cm 2), very narrow emission peak (FWHM=0.5 nm) emerges and its intensity increases superlinearly with increasing the pump power. The stimulated emission light is multimode laser relative to incident area and can be observed in all directions, showing a random laser emission due to the formation of a closed-loop path for scattered light in the ZnO thin film." @default.
- W2365950861 created "2016-06-24" @default.
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- W2365950861 date "2004-01-01" @default.
- W2365950861 modified "2023-09-24" @default.
- W2365950861 title "Electrochemical Deposition and Stimulated Emission of Zinc Oxide Thin Films" @default.
- W2365950861 hasPublicationYear "2004" @default.
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