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- W2366126700 abstract "Sn S thin films were deposited on FTO glass with the magnetron sputtering method. The crystal structure,surface topography and optical properties of Sn S films prepared with different sputtering parameters were investigated by X-ray diffraction( XRD),scanning electron microscopy( SEM) and ultraviolet-visible spectrophotometer( UV-VIS),which obtain the optimum puttering parameter. The results show that under the optimum conditions of sputtering power of 28 W and working pressure of 2. 5 Pa,the films has the best( 111)preferred orientation,the morphology of Sn S particles whose size are about 370 nm exhibit single leaf form and distribute uniformity,and the surface of Sn S is smooth and density. The absorption coefficient of Sn S film can reach 105cm- 1which is high than the Sn S film that prepared by other methods,and the energy bad gap of Sn S film is 1. 48 e V that is very close with the optimal band gap required by semiconductor solar cell( 1. 5 e V)." @default.
- W2366126700 created "2016-06-24" @default.
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- W2366126700 date "2015-01-01" @default.
- W2366126700 modified "2023-09-24" @default.
- W2366126700 title "Microstructure and optical properties of Sn S thin films prepared by magnetron sputtering" @default.
- W2366126700 hasPublicationYear "2015" @default.
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