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- W2366249224 abstract "AZO films are deposited onto the glass substrates by DC magnetron sputtering method.The influences of oxygen flow on optoelectronic properties and microstructure of AZO are studied.The results show that oxygen flux can dramatically affect the optoelectronic properties and crystalline status of AZO films.The films have excellent transmittance but poor electronic conductivity at an oxygen flux higher than 0.08×10-6 m3/s.While the oxygen flux is lower than 0.04×10-6 m3/s,the films deposited exhibit metallic characteristic(conductive but not transparent).Accordingly,only in a narrow range of oxygen flux AZO films with both high transmittance and low resistivity can be obtained or prepared.The film prepared at 0.06×10-6 m3/s oxygen flux has a low resistivity of 2.39×10-3 Ω·cm,and a transmittance of above 90% in the visible range." @default.
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- W2366249224 date "2011-01-01" @default.
- W2366249224 modified "2023-09-24" @default.
- W2366249224 title "Influence of Oxygen Flux on Optoelectronic Properties of AZO Films Deposited by Magnetron Sputtering Method" @default.
- W2366249224 hasPublicationYear "2011" @default.
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