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- W2366683556 abstract "In order to improve the accuracy of the leveling and focusing stage of lithography,an accuracy assigning method is proposed in this paper. Firstly,the relationship between the total accuracy index and the logic axis is established by using the geometric relation. Then,based on the kinematic principles,the relationship between the logic axis and the physical axis of the leveling and focusing stage's general mechanism is established. And the accuracy assigning model of the leveling and focusing stage is also established by using the function error principle. Moreover,an experimental platform which provides an accuracy of 100 nm re-orientation is built. This platform uses the piezoelectric ceramics as driving,the flexible reed as guide,and the capacitance as sensor. Finally,the result of the experimental platform reveals the re-orientation accuracy of this leveling and focusing stage can reach to 90 nm,which demonstrates that the accuracy assigning model of the lithography leveling and focusing stage is correct." @default.
- W2366683556 created "2016-06-24" @default.
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- W2366683556 date "2016-01-01" @default.
- W2366683556 modified "2023-09-27" @default.
- W2366683556 title "Research on the Accuracy Assigning Method of the Leveling and Focusing Stage of Lithography" @default.
- W2366683556 hasPublicationYear "2016" @default.
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