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• W2366772014 abstract "Diamond films were prepared by plasma assistant hotfilament chemical vapor deposition when the flow rate of H_2 was 200sccm,the flow rate of CH_4 was 2～12sccm,the substrate temperature was 700～900℃,the bias voltage was 0～400V and the pressure was 4kPa.It was found the effect of the flow rate of methane,substrate temperature and bias voltage on the deposition of the diamond films.At the same time,the diamond films were investigated by SEM,AFM and XRD." @default.
• W2366772014 created "2016-06-24" @default.
• W2366772014 creator A5048872057 @default.
• W2366772014 date "2005-01-01" @default.
• W2366772014 modified "2023-09-27" @default.
• W2366772014 title "Study on deposition parameter of diamond film prepared by plasma hot-filament chemical vapor deposition" @default.
• W2366772014 hasPublicationYear "2005" @default.
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