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- W2367939220 abstract "With the use of RF magnetron sputtering method,ZnO film is deposited on Si substrate.XRD spectrum has been employed for analyzing the effect of film′s different growth conditions and annealing treatment on the film′s crystal character.Scherrer function is made use of to investigate the diameter of crystal grain of samples prepared under different conditions.It is found that the diameter of crystal grain can grow up to 20 nm after annealing,but the grain′s orientation has to meet with some change.Bragg function is made use of to investigate the effect of annealing on the distance between crystal faces.Then,the investigation is conducted into the possible transition of the film′s stress type.The use of a metallomicroscope helps to verify the outcomes achieved by XRD and to observe the columnar growth mode of ZnO.Investigation results show that,under the conditions of 120 W sputtering power and 500° substrate temperature,ZnO film of fairly good quality with(002) orientation can be produced.PL spectrum indicates that ultraviolet excitation peak exists at 363 nm while blue excitation peak-at 463 nm." @default.
- W2367939220 created "2016-06-24" @default.
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- W2367939220 date "2009-01-01" @default.
- W2367939220 modified "2023-09-27" @default.
- W2367939220 title "THE EFFECT OF ZnO FILM′S GROWTH CONDITIONS ON ITS CRYSTAL AND ITS OPTICAL CHARACTER" @default.
- W2367939220 hasPublicationYear "2009" @default.
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