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• W2368541518 abstract "In the process of SiC film fabricated by chemical vapor deposition method,kinetic process of chemical reaction in reaction zone and the deposition and diffusion of matrix surface were studied respectively.With kinetic Monte Carlo method,a three-dimensional atomic-scale of {111}-oriented SiC film is established and its growth process is simulated by MATLAB.The results show that the growth of film has three stages including form of little islets,mergence and expanding of islets and dynamic balance between islets.With the increase of substrate temperature,deposition rate,surface roughness and height of film all increase.When the deposition rate increases,surface roughness increases while relative density decreases.Moreover,the simulation results are in well agreement with the relevant theory and experimental result." @default.
• W2368541518 created "2016-06-24" @default.
• W2368541518 creator A5017651188 @default.
• W2368541518 date "2008-01-01" @default.
• W2368541518 modified "2023-09-25" @default.
• W2368541518 title "Atomic Scale Simulation of {111}-Oriented SiC Film Growth by Chemical Vapor Deposition Method" @default.
• W2368541518 hasPublicationYear "2008" @default.
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