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- W2368628497 abstract "In order to determine the optimum heat temperature of SiO2-TiO2 film preparation course,we calcined different SiO2 doping TiO2 samples under 400 ℃ or 500 ℃ using muffle furnace,and then the behaviour of these films were checked by contact angle testing.The results showed that within certain doping range,the hydrophilic behavior of samples doped SiO2 have obvious improvement,and within that range the hydrophilic behavior of samples calcined under 500 ℃ is better than that of samples calcined under 400 ℃.SEM and XRD indicated that:the particle diameter of samples calcined under 500 ℃ is bigger,and samples have anatase propertises,while samples calcined under 400 ℃ have amorphism feature.SiO2 doping has inhibited growth of TiO2 crystal particle and transform of TiO2 crystal form.The hydrophilic behavior of anatase crystal form is much better than that of amorphism,so 500 ℃ is the optimum temperature of SiO2-TiO2 film preparation course." @default.
- W2368628497 created "2016-06-24" @default.
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- W2368628497 date "2012-01-01" @default.
- W2368628497 modified "2023-09-25" @default.
- W2368628497 title "Influence of heat temperature on SiO_2-TiO_2 film hydrophilicity" @default.
- W2368628497 hasPublicationYear "2012" @default.
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