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- W2368761656 abstract "Copper films were deposited on self-assembled monolayers(SAMs) modified SiO_2 substrates by chemical vapor deposition(CVD),and then the deposited copper films were characterized and analyzed.It shows that the terminated functional groups of SAMs serve as the reaction sites for the copper deposition. The stronger interaction between the copper atoms and the functional groups of SAMs enhances the copper deposition and the interfacial adhesion of copper film onto the substrates,and also leads to a better effect on inhibiting the copper atoms diffusing into the silicon substrate as a diffusion barrier.The copper grown on SAMs-modified SiO_2 substrates preferentially binds to a set of determined crystalline faces because of the assembling of the organic layer." @default.
- W2368761656 created "2016-06-24" @default.
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- W2368761656 date "2008-01-01" @default.
- W2368761656 modified "2023-09-23" @default.
- W2368761656 title "Effects of Terminated Functional Groups of Self-assembled Monolayers on Chemical Vapor-deposited Copper Films" @default.
- W2368761656 hasPublicationYear "2008" @default.
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