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- W2369966678 abstract "Temperature is one of the main critical factors during fabrication of Indium tin oxide(ITO) film using Rf-magnetron sputtering.The object of our task is to obtain stable film properties with exceptional low resistivity and high ransmittance in the visible and infrared spectrum range.The electrical and optical properties of ITO films are improved by using varied deposition temperature.Scanning electron microscopy(SEM) is used to analyze the surface morphology of ITO thin films.It could be found that the grain size of ITO increased with substrate temperature increasing from 50 ℃ to 200 ℃.After post-annealing,the electrical property of multi-crystalline ITO films could be effectively improved.ITO films with the resistivity as low as 2.18×10~(-4) Ω·cm and transparency of 94% at 800 nm are obtained after vacuum annealing at 300 ℃ for 2 h,while deposited at a working pressure 1 Pa,substrate temperature 200 ℃,and input power 200 W." @default.
- W2369966678 created "2016-06-24" @default.
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- W2369966678 date "2005-01-01" @default.
- W2369966678 modified "2023-09-23" @default.
- W2369966678 title "Effect of Deposition Temperature on ITO Thin Films Prepared by RF Magnetron Sputtering" @default.
- W2369966678 hasPublicationYear "2005" @default.
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