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- W2369969050 abstract "TiO_2 thin films were sputtered on ITO/quartz substrate by DC reactive magnetron sputtering. The microstructure, surface morphology and absorption spectrum of the films were tested by Raman spectroscopy, AFM and UV-3150 spectrophotometer, respectively. The effects of growth conditions, such as sputtering pressure, the O_2/Ar ratio and annealing temperature, on the microstructure of TiO_2 thin films were investigated. The photoconductivity of anatase TiO_2 thin films was investigated by using a sandwich structure of C(glue)/ TiO_2/ITO. The experimental results show that lower sputtering, appropriate O_2/Ar ratio and relatively high annealing temperature are beneficial to crystallize the TiO_2 thin films. The UV photoresponse rise relaxation time of 3s and stable photocurrent of 2.1mA of anatase TiO_2 thin films measured at bias voltage of 2V were obtained. The sensitivity and stability to the UV photoresponse indicate that it is possible for TiO_2 thin films to be a new UV detector material." @default.
- W2369969050 created "2016-06-24" @default.
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- W2369969050 date "2005-01-01" @default.
- W2369969050 modified "2023-09-23" @default.
- W2369969050 title "Deposition and UV Photoconductivity Characteristics of Anatase TiO_2 Thin Films" @default.
- W2369969050 hasPublicationYear "2005" @default.
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