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• W2372644251 abstract "Fabrication of nanostructures is an important part of nanotechnology,and atom li thography technology is a new nanostructure fabrication method. A me tastable a rgon atomic beam generated by high-voltage discharge is collimated to minimize t he divergence angle of atomic beam.Metastable atoms are quenched when well-c ollimated beam travels through the light standing wave perpendicular to the prop agation direction of the atomic beam,and then deposited onto the substrate. SAM abso rbed on substrate surface is damaged by metastable atoms,and the nanometer-scale structure can be fabricated with etching technologies. The basic principle,expe rimental schemes,correlative theory of this technique and simulation results are given." @default.
• W2372644251 created "2016-06-24" @default.
• W2372644251 creator A5013279354 @default.
• W2372644251 date "2003-01-01" @default.
• W2372644251 modified "2023-09-24" @default.
• W2372644251 title "Using metastable argon atomic beam to fabricate nanostructures" @default.
• W2372644251 hasPublicationYear "2003" @default.
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