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- W2373324318 abstract "WT5BZ]Using X ray diffraction and Rutherford back scattering techniques, a study has been made of the oxidation characteristics of copper thin films by Cr ion implantation It is indicated that the implantation of Cr ions remarkably changes the oxidation behavior and the copper oxide structures Ion implantation suppresses the diffusion of copper atoms during oxidation and then inhibits the change of Cu 2O to CuO The formation mechanism of oxides before and after implantation was discussed" @default.
- W2373324318 created "2016-06-24" @default.
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- W2373324318 date "2000-01-01" @default.
- W2373324318 modified "2023-09-24" @default.
- W2373324318 title "The Effect of Ion Implantation on the Characteristics of Oxide Formation of Copper Thin Films" @default.
- W2373324318 hasPublicationYear "2000" @default.
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