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- W2374476283 abstract "Transparent conducting Ti-doped ZnO(TZO) films and Ti-Al co-doped ZnO(TAZO) films with high transparency and relatively low resistivity were successfully prepared on water-cooled glass substrates by a direct current magnetron sputtering at the room temperature.The microstructure,stress,and optic-electrical properties of the prepared films were investigated.The results showed that all the deposited films are polycrystalline with a hexagonal structure and a preferred orientation perpendicular to the substrates along the c-axis.The optical and electrical properties of TAZO thin films are better than that of TZO thin films.When the sputtering power is 100 W,TZO films with the lowest resistivity of 5.17×10-4 Ω·cm and TAZO films with the resistivity of 3.88×10-4 Ω·cm are obtained.The visible light transmittance of all TAZO films are above 91%,while the visible light transmittance of all TZO films is only above 85%." @default.
- W2374476283 created "2016-06-24" @default.
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- W2374476283 date "2010-01-01" @default.
- W2374476283 modified "2023-09-26" @default.
- W2374476283 title "Comparison of Preparation and Performance between Ti-doped ZnO Thin Films and Ti-Al Co-doped ZnO Thin Films" @default.
- W2374476283 hasPublicationYear "2010" @default.
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