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- W2376921807 abstract "The mechanism and kinetics of parathion degradation by UV photolysis combined with Fenton reagent oxidation were investigated.The concentration of parathion was determined by GC,and the effects of oxidizing degradation were indicated by the half-life.Factors influencing the photolysis,such as concentrations of Fe～(2+),H2O2 and pH,were studied.The results showed that the oxidation of parathion followed pseudo-first-order kinetics.The concentration of Fe～(2+)and H2O2 influenced the oxidation of parathion greatly,and increasing Fe～(2+)and H2O2 concentrations favored the oxidation.The efficiency of oxidizing degradation was reduced by increasing Fe～(2+)and H2O2 by some extent;The optimum oxidizing degradation process occurred at pH =3,where the half-life was 0.256 h.The pseudo-first-order kinetics equation was Ct = 4.9652e-2.7066t." @default.
- W2376921807 created "2016-06-24" @default.
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- W2376921807 date "2009-01-01" @default.
- W2376921807 modified "2023-09-24" @default.
- W2376921807 title "Mechanism and kinetics of parathion degradation by UV-Fenton treatment" @default.
- W2376921807 hasPublicationYear "2009" @default.
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