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- W2377522905 abstract "Helicon plasma sputtering of Fe/Si multilayer followed by thermal annealing in Ar atmosphere was used to fabricate β-FeSi_2 films. [Fe 0.5nm/Si 1.6nm]_ 120 multilayer was deposited on Si(100) substrate and then the samples were annealed at 900℃ for 2h or at 9001000℃ for 10s. Annealed samples were characterized by X-ray diffractometry(XRD), Rutherford backscattering spectroscopy, scanning electron microscopy and optical absorption measurement. (202)/(220) oriented β-FeSi_2 films are fabricated from the multilayer according to XRD patterns. It is found that there is a very small redistribution of Fe and Si components in the films during the thermal annealing, so that a good stoichiometry of FeSi_2 can be obtained. It is also revealed by scanning electron microscopy that multilayer technology can result in a smooth surface for β-FeSi_2 films. Optical absorption spectra demonstrate that the films have a direct band gap of 0.9eV at room temperature." @default.
- W2377522905 created "2016-06-24" @default.
- W2377522905 creator A5008571943 @default.
- W2377522905 date "2005-01-01" @default.
- W2377522905 modified "2023-09-23" @default.
- W2377522905 title "Fabrication of iron disilicide from multilayer by helicon plasma sputtering" @default.
- W2377522905 hasPublicationYear "2005" @default.
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