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- W2377580653 abstract "Au/NiCr/Ta multi-layered metal films were deposited on Al_2O_3 substrate by magnetron sputtering and then Au film was chemically plated.The crystal orientation,residual stress and surface morphology were investigated,and comparison was made between plating and magnetron sputtering technology by X-ray diffractrometry and(atomic) force microscopy.Au grain increases from 60 to 400nm after plating.The results indicate that the plating technology can inherit the crystal orientation from magnetron sputtering,enlarge the preferred orientation,and harmonize the residual stress.The surface roughness of Au films increases after plating." @default.
- W2377580653 created "2016-06-24" @default.
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- W2377580653 date "2005-01-01" @default.
- W2377580653 modified "2023-09-23" @default.
- W2377580653 title "Relationship between plating and magnetron sputtering for metallic films" @default.
- W2377580653 hasPublicationYear "2005" @default.
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