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- W2377767567 abstract "Several e-beam exposure technologies are described, which are recently used andbeing developed, such as scanning electron microscope, gauss electron beam lithograph, moldingbeam and projection beam lithograph, etc. Applications and prospects of those technologies are alsocompared and analyzed." @default.
- W2377767567 created "2016-06-24" @default.
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- W2377767567 date "2006-01-01" @default.
- W2377767567 modified "2023-09-23" @default.
- W2377767567 title "Technologies and Applications of Electron Beam Exposure" @default.
- W2377767567 hasPublicationYear "2006" @default.
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