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- W2378393569 abstract "Based on 1.8V NMOS devices which are fabricated in certain 0.18μm-CMOS process,gate grounded NMOS(GGNMOS) ESD devices are analyzed and compared from process perspective by using TLP testing system.The effects in GGNMOS ESD performances with salicide block(SAB) and ESD implant are introduced,respectively.Uniform turn-on of GGNMOS is important.Comparing with the GGNMOS device with or without SAB while keep all other layout parameters the same,those with SAB could improve current uniformity,which in turn show higher robustness.The transient triggering voltage of GGNMOS is about 7V,it will not threaten gate oxide reliability,so PESD implant is not necessary." @default.
- W2378393569 created "2016-06-24" @default.
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- W2378393569 date "2011-01-01" @default.
- W2378393569 modified "2023-09-25" @default.
- W2378393569 title "Analysis of ESD Performance for Gate Grounded NMOS Device" @default.
- W2378393569 hasPublicationYear "2011" @default.
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