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- W2378636754 abstract "Based on the FEA of static electromagnetic field distribution on target surface in magnetron sputtering system under loading conditions, the movement path of single charged particle was simulated and showed an upward spiral. Meanwhile, the distribution of particle beams on target surface and etched profile were simulated. Then, the measured and simulated profiles of etched target surface were compared,and the results showed that they are coincided." @default.
- W2378636754 created "2016-06-24" @default.
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- W2378636754 date "2009-01-01" @default.
- W2378636754 modified "2023-09-26" @default.
- W2378636754 title "Study on movement of charged particles and etched profile on target surface during magnetron sputtering" @default.
- W2378636754 hasPublicationYear "2009" @default.
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