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- W2378638487 abstract "The influence of basic processing parameters on the deposition of a-CN_x was studied.The results show that the increase of N flux enhances the deposition rate of the film as well asincreases its N content. While higher sputtering power leads to higher deposition rate. Further-more, the employment of bias will prove to be beneficial in the preparation of CN_x film in thatit not only facilitates the densification process and produces a smoother surface morphology, butalso increases the content of N in the film." @default.
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- W2378638487 title "Influence of Processing Parameters on the Deposition of a-CN_x Films" @default.
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