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- W2378823053 abstract "ZnO thin films were prepared by pulsed filtered cathodic vacuum arc deposition system under various negative substrate bias on Si(100) at 300 ℃ and 4.0×10-2 Pa of oxygen pressure.The surface morphology,structural and strain properties of the ZnO thin films were investigated using AFM and X-ray diffraction.It is found that the surface morphology is not significantly influenced by the negative substrate bias.The films show c-axis oriented(002) hexagonal wurtzite crystal structure.It has been found that the grain size of ZnO thin films varies from 16.7nm to 39.0nm under different negative substrate bias and their interior strain are strongly correlated to the negative substrate bias.The prepared films exhibited only tensile stress and the tensile stress increased with the increment of the negative substrate bias." @default.
- W2378823053 created "2016-06-24" @default.
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- W2378823053 date "2009-01-01" @default.
- W2378823053 modified "2023-09-25" @default.
- W2378823053 title "Influence of Negative Substrate Bias on Structure and Strain Prosperities of ZnO Films Prepared by PFCVAD" @default.
- W2378823053 hasPublicationYear "2009" @default.
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