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- W2379884502 abstract "The diffusion of nitrogen atom in Cr thin film is studied. The temperature of the film under ion beam bombarding was measured by a new method and discussed theoretically. The temperature measured by means of thin film resistor gave a same level of volume. On the basis of the conservation of energy in equilibrium state, a semi-theoretical formula has been derived. The factors ion beam assisted diffusion were discussed. The result of AES analysis indicates that the arrangement of N atoms is long and smooth. HREM analysis and dynamic resistance measurement show that the Cr-nitride formed by N~+ implantation is in the near surface layers and can not grow very deep. The assemble of N was observed by means of TEM." @default.
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- W2379884502 date "1992-01-01" @default.
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- W2379884502 title "DIFFUSION EFFECT IN THE FORMATION PROCESS OF Cr-NITRIDE UNDER N~+ IMPLANTATION" @default.
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