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- W2380041334 abstract "Titanium dioxide(TiO2) films were deposited on unheated glass substrates by medium-frequency reactive magnetron sputtering process with twin Ti target.To achieve a deposition rate over 50nm/min which is much higher than that by other processes,the stable and quick deposition proceeded in a 'transition region' via an advanced multichannel reactive plasma gas control system,i.e.,the plasma emission monitoring(PEM),thus obtaining the homogeneous TiO2 films.With the increasing SP value,the increase in deposition rate became linear.Comparing the spectra of the films prepared at different SP values,it was found that the proper SP value is in the range from 2.5 to 3.8 for the quick and stable deposition of TiO2 thin films." @default.
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- W2380041334 date "2011-01-01" @default.
- W2380041334 modified "2023-09-23" @default.
- W2380041334 title "Study on the TiO_2 films deposited by medium-frequency reactive magnetron sputtering under PEM" @default.
- W2380041334 hasPublicationYear "2011" @default.
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