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• W2380176327 abstract "Electrophoretic deposition (EPD) is used for the growth of carbon nitride (C3N4) layers on conductive substrates. EPD is fast, environmentally friendly, and allows the deposition of negatively charged C3N4 with different compositions and chemical properties. In this method, C3N4 can be deposited on various conductive substrates ranging from conductive glass and carbon paper to nickel foam possessing complex 3D geometries. The high flexibility of this approach enables us to readily tune the photophysical and photoelectronic properties of the C3N4 electrodes. The advantage of this method was further illustrated by the tailored construction of a heterostructure between two complementary C3N4, with marked photoelectrochemical activity." @default.
• W2380176327 created "2016-06-24" @default.
• W2380176327 creator A5006868699 @default.
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• W2380176327 date "2016-05-11" @default.
• W2380176327 modified "2023-09-30" @default.
• W2380176327 title "Electrophoretic Deposition of Carbon Nitride Layers for Photoelectrochemical Applications" @default.
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• W2380176327 doi "https://doi.org/10.1021/acsami.6b02853" @default.
• W2380176327 hasPubMedId "https://pubmed.ncbi.nlm.nih.gov/27148889" @default.
• W2380176327 hasPublicationYear "2016" @default.
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