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- W2380462049 abstract "The effect of low energy ion beam erosion on silicon surface quality was studied.The silicon(100) surface was eroded,controlling the incident energy and erosion time of ion beam from the cool cathode ion source.The eroded surface morphology was observed with atomic force microscopy(AFM) and the surface roughness was measured with noncontact measurement instrument.The results showed as follows.The surface roughness decreased,surface smoothing appeared mainly,with the increasing of incident energy from 800 eV to 1 200 eV,while the parameters are the incident ion beam density of 20 μA/cm2,erosion time of 30 min,etching distance of 7 cm.The minimum surface roughness of 0.341 nm was obtained when the incident energy reached 1 200 eV.Further increasing of the incident energy upto 1 600 eV,led to increase surface roughness.While the incident energy reached 1 400 eV,the self-organized nano-dots structure was observed on the surface of silicon by the AFM,the surface roughing appeared mainly.The surface roughness decreased first and then increased afterwards with the extension of erosion time.While extending the erosion time to 90 min,the surface roughness reached 1.245 nm.It was observed that the point-like structures arranged uniformly with the time extended due to atomic diffusion on the surface." @default.
- W2380462049 created "2016-06-24" @default.
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- W2380462049 date "2012-01-01" @default.
- W2380462049 modified "2023-09-28" @default.
- W2380462049 title "Morphology and Roughness on Silicon Surface During Low Energy Ion Beam Erosion" @default.
- W2380462049 hasPublicationYear "2012" @default.
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