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- W2380607875 abstract "The paper summarizes research process in SOI formed by N ion-implantation in silicon.In the paper,the factors influcing nitrogen ion-implantation and the electric properties of implanted layer are discussed in details.Furthermore,N ion-implantation that is used in ultra-thin gate oxide parts and in restraining the diffusion of doped impurity is also described." @default.
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- W2380607875 date "2003-01-01" @default.
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- W2380607875 title "Nitrogen Ion-implantation in Silicon" @default.
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