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- W2380811030 abstract "In order to improve the compactness of TiB2 coating,the samples with different substrate bias(floating,- 30 V and- 90V)have been deposited by non-reactively magnetron sputtering. The microstructure was analyzed by X-ray diffraction(XRD) and scanning electron microscope(SEM). The nanoindentation,Vickers indentation and wear tests were used to characterize the mechanical properties. The results show that only hexagonal TiB2 crystalline can be identified from all of the coatings. The hardness of coating under floating is lower( ~ 15GPa) with loose columnar structure. With the increase of bias voltage,the columnar structures are found to be compact and even disappear,and the hardness and tear-resistant property of which enhance. When the bias voltage increases from-30 V to- 90 V,the size of crystal grain grows by one time to 21 nm with the improvement of hardness from 35. 5GPa to 61. 9GPa. The columnar structure becomes compact and finally disappears. Simultaneously,the wear rate is reduced to 5. 6 x 10- 16m3/Nm,when the coating is subjected to the sliding test against Al2O3 ball,one order of magnitude lower than that of the coating deposited at- 30 V bias." @default.
- W2380811030 created "2016-06-24" @default.
- W2380811030 creator A5059355490 @default.
- W2380811030 date "2014-01-01" @default.
- W2380811030 modified "2023-09-23" @default.
- W2380811030 title "Influence of Bias Voltage on Microstructure and Properties of Magnetron Sputtering TiB_2 Coating" @default.
- W2380811030 hasPublicationYear "2014" @default.
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