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- W2380919073 abstract "Ti(C,N) and TiN/Ti(C,N) multilayer films were deposited on(100) silicon substrates by unbalanced magnetron(UMB) sputtering process.The films were characterized by X-ray diffraction(XRD) and micro-hardness test.The results show that the lattice parameters of Ti(C,N) film gradually increase and its microhardness first increases and then decreases with the increase of carbon content,the preferred orientiation of TiN/Ti(C,N) multilayer film depends on modulation period and thickness ratio of TiN film to Ti(C,N) film and microhardness of the films is enhanced in a modulation of 6～8 nm and Ti(C,N) thickness of 1～2 nm.Ti(C,N) and TiN/Ti(C,N) films are both of δ-NaCl structure.The microhardness increasing of Ti(C,N) thin films is because of solid solution.The strengthening of the multilayer films is due to the alternating stress field resulted from coherent strain of the interface between TiN and Ti(C,N) films." @default.
- W2380919073 created "2016-06-24" @default.
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- W2380919073 date "2010-01-01" @default.
- W2380919073 modified "2023-09-26" @default.
- W2380919073 title "Microstructure and microhardness of Ti(C,N) and TiN/Ti(C,N) multilayer films" @default.
- W2380919073 hasPublicationYear "2010" @default.
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